MBRAUN OLED / PLED UV Cleaning

The MBRAUN MB-UV-O3 is an integrated system for UV-Ozone cleaning of semiconductor and optical surfaces, providing a clean hydrocarbon-free surface which significantly improves thin film and UV-resin adhesion. The simultaneous application of ozone and UV light is highly effective in removing residual organic and carbon contamination.

The MBRAUN MB-UV-O3 Cleaning System is a bench top system with a sealed cleaning chamber and can accommodate samples up to 165 mm x 165 mm x 10 mm thick. For smooth, easy sample loading and unloading the substrate to be cleaned is placed on PEEK pins which are located on a hardcoated aluminium plate. A timer set and display feature allows timing of the cleaning process from 1-999.9 minutes. An audible alarm sounds periodically upon completion of the cleaning process. Safety interlocks are provided to shut off the UV radiation if the door is opened or the exhaust is interrupted.

The irradiation chamber is sealed during operation, with an oxygen gas inlet and an ozone vent providing complete isolation of the ozone from the inert atmosphere. The closed chamber is class-10 clean room compatible and provides a clean, particle-free environment for the sample during irradiation. A 0-10 SLPM flow meter is used to control the oxygen flow during the cleaning process. The oxygen flow is automatically shut off after termination of the process. The entire equipment is available as a stand-alone version or integrated into an MBRAUN glovebox. Automatic loading and unloading is available upon request.

MB UV-03